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Don't you think that a lot more improvement in variability and integration can be achieved with better optics? (for the photolithography, of course. I don't remember what they used for plasma etching and ion implantation.) I don't believe that they have explored a lot on that front yet.

> So if you want a paradigmatic shift, you need low cost patterning, and the best way I can see is to use clever chemistry and a much different design style.

Is that a speculation, or do you have a more concrete idea about what needs improvement and how? I'm especially curious about the 'much different design style' part. Could you elaborate that?





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